Winbond Semiconductor Faciluty

Taiwan

About

This Work

A new greenfield 300mm semiconductor fabrication facility supported by a fully equipped central utility building. MEC provided electrical engineering for the site’s high-voltage 161 kV substation and oversaw the design of the 12.47 kV electrical distribution necessary to support advanced 300mm wafer processing. The project required highly stable power infrastructure, tight coordination with process systems, and industrial-scale capacity planning.

Project Specifications

Facility Type:

300mm semiconductor fabrication plant

Facility Infrastructure:

Central Utility Building with mechanical, electrical, and process utilities

Power Systems:

  • 161 kV primary substation design

  • 12.47 kV medium-voltage distribution

  • Redundant and looped distribution for fab reliability

  • Capacity planning for high-density tool loads

Specialized Systems Supported:

  • Semiconductor process tool power

  • Cleanroom systems integration

  • Precision environmental control loads

  • High-availability power distribution for 24/7 operation

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